Our patented technology enables us to inspect the quality of gratings and thin films used in photonics, semiconductors, and quantum technologies. Using this technology, we can determine modifications of geometrical parameters and optical properties during the fabrication of nanostructures in a contact-free and non-destructive manner.
This instrument is based on the principles of Fourier microscopy with collimated illumination that allows us to collect the intensity of diffracted and reflected light simultaneously. Using this technique, we extract crucial information such as grating pitch, height, width/diameter, residual layer thickness, side wall angle, and refractive index in a comprehensive manner, all at the same time.
Features:
Contact us for questions related to your applications or for demonstration trials.
By scanning the angle of incident on the surface of a sample, we determine intensity of reflected beam and / or diffracted orders at each incident angle and for a given polarization (TE and / or TM). An illustrative example of such a measurement for a grating is shown in the figure below. Minor modifications in samples such as geometrical changes, refractive index variations or inhomogeneities in the substrate will affect the measured curves significantly. By fitting such curves, we extract geometrical parameters and refractive indices of the measured samples.
info@teranova.nl
+31 62 819 28 20
TeraNova BV, Flux Building (office 1.116),
Groene Loper 19, 5612AP, Eindhoven, The Netherlands
KvK number: 75646285 - VAT number: NL860351518B01
Copyright © All Rights Reserved - 2024